FINAL PROGRAM

INTERNATIONAL SYMPOSIUM ON



ADHESION ASPECTS OF THIN FILMS (INCLUDING ADHESION MEASUREMENT AND METALLIZED PLASTICS)



To be Held at the Grosvenor Resort Hotel, Orlando, FL; December 15-16, 2003
This symposium integrates key aspects of three symposia which were held separately in the past dealing with adhesion aspects of thin films, adhesion measurement and metallized plastics. The main idea is to provide a broader venue for the discussion and exploration of these three closely related fields of endeavor. The main part of the symposium is concerned with those aspects of thin film technology that have a direct bearing on film adhesion to the substrate. This is a topic of both fundamental interest to thin film technology and of great practical concern in applications where films of high stress are involved. The coating of diamond films onto machine tools is one of many applications where thin films adhesion is a critical factor in coating durability. The second part of the symposium will deal with the ability to accurately measure the adhesion of coatings which is a crucial part of the development and manufacturing process dealing with coatings and films. Finally, metallized plastics are a burgeoning technology heavily dependent on thin film adhesion with applications ranging from decorative design to optical coatings to advanced thin film wiring schemes in the microelectronics industry. Metallized plastic films allow the technologist to capitalize on the favorable properties of two disparate classes of materials to create new and unique products which transcend the performance and usefulness that can be obtained by either class alone.

The invited speakers have been selected so as to represent widely differing disciplines and interests, and they hail from academic, governmental and industrial research laboratories. This meeting is planned to be a truly international event both in geographic coverage as well as in spirit. Note: the address listed is valid for the presenting author and may or may not be valid for the co-authors.



SESSION I: MONDAY, DECEMBER 15, 2003



8:30-8:35: Introductory Remarks



8:35-9:10: Robert C. Cammarata; Johns Hopkins University, Department of Materials Science and Engineering and Department of Mechanical Engineering, 102 Maryland Hall, Baltimore, MD 21219; Thin Film Residual Stress: Theory and Experiment



9:10-9:45: N. M. Jennett, R. Jacobs and J. Meneve; Materials Centre, National Physical Laboratory - NPL, Queens Road, Teddington, Middlesex, TW11 0LW, UK; Advances in Adhesion Measurement Good Practice: Use of a Certified Reference Material for Evaluating the Performance of Scratch Test Instrumentation



9:45-10:15: N. M. Jennett, G. Aldrich-Smith and A. S. Maxwell; NPL Materials Centre, National Physical Laboratory, Teddington, Middlesex, TW11 0LW, U.K.; Recent Developments in Instrumented (Nano)Indentation for the Measurement of Coating Mechanical Properties and Adhesion



10:15-10:45: COFFEE BREAK



10:45-11:15: Akira Kinbara, Eiji Kusano and Hidehito Nanto; Advanced Materials Science, R&D Center, Kanazawa Institute of Technology 3-1,Yatsukaho, Matto-City, Ishikawa-Pref. 924-0838, JAPAN; Hardness Effect on Adhesion Strength of TiO2 Films on Glass Substrates Measured by Scratching Test



11:15-11-45: Shigeru Baba, Yoshihiro Yamaguchi, Masashi Ogawa and Takeo Nakano; Department of Applied Physics, Seikei University, 3-3-1, Kichijoji-Kitamachi, Musashino, Tokyo 180-8633, JAPAN; Two Critical Events Observed on Cu Films on Glass Substrate in the Micro- Scratch Test



11:45-12:15: Satoru Iwamori, Yuichi Nagayama, Yousuke Yamagata, Yoshinori Yamada: Faculty of Engineering, Kanazawa University, 2-40-20, Kodatsuno, Kanazawa 920-8667, JAPAN; Mechanical Properties of Sputtered PTFE Thin Films



12:15-1:45: LUNCH BREAK



SESSION II: MONDAY, DECEMBER 15, 2003



1:45-2:15: Kang-Wook Lee, J. C. Hedrick, E. Simonyi, and C. Tyberg; IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598; Adhesion of SiLKTM Dielectric in Semiconductor Interconnects



2:15-2:45: R. E. Southward, M. Pevzner, C. J. Dean, and D. W. Thompson; Dept of Chemistry, College of William and Mary, Williamsburg, VA 23187; Synthesis of Hexafluoroisopropylidene Containing Polyimide-Silver Nanocomposite Films Evolving Specularly Reflective Metal Surfaces



2:45-3:15: D. W. Thompson and Robin E. Southward; Department of Chemistry, College of William and Mary, Williamsburg, VA 23187; Synthesis of Hexafluoroisopropylidene-Containing Polyimide-Silver Nanocomposite Films



3:15-3:45: COFFEE BREAK



3:45-4:15: S. K. Koh, J.S. Cho, S. Han, K.H. Kim and Y.W. Beag; Research & Development Center, P&I Corporation, Shinnae Technotown 405, Sangbong-Dong, Jungrang-Gu, Seoul 131-221, KOREA; State-of-the-art Overview: Surface Modification of Polymers by Ion Assisted Reaction



4:15-4:45: Satoru Iwamori, Fuminori Tateishiv and Yoshinori Yamada: Faculty of Engineering, Kanazawa University, 2-40-20, Kodatsuno, Kanazawa 920-8667, JAPAN; Characterization of Polyethylene-Metal Thin Films by Vapor Deposition



4:45-5:15: Roger J. Narayan; School of Materials Science and Engineering, 771 Ferst Dr., NW, Atlanta, GA 30332-0245; Adhesion Properties of Diamondlike Carbon/Hydroxyapatite Nanocomposites



5:15-5:45: Wei-Hua Xu, Ming-Hao Zhao and Tong-Yi Zhang; Department of Mechanical Engineering, Hong Kong University of Science and Technology Clear Water Bay, Kowloon, Hong Kong, CHINA; The Role of Plastic Deformation of Rough Surfaces in the Size-Dependent Hardness



SESSION III: TUESDAY, DECEMBER 16, 2003



8:30-9:00: O. Knotek, E. Lugscheider, K. Bobzin and C. Piñero; Materials Science Institute, Aachen University, Augustinerbach 4-22, 52062 Aachen, GERMANY; F. Klocke, D. Lung and J. Grams; Laboratory for Machine Tools and Production Engineering (WZL), Aachen University, Steinbachstrasse 53, 52074 Aachen, GERMANY; Selection of Efficient Coatings for Milling Inconel 718 Considering its Adhesion Properties



9:00-9:30: J. M. Castanho and M. T. Vieira; ICEMS - Materials and Surface Engineering Group, Mechanical Engineering Department - Polo II, University of Coimbra, PORTUGAL; Laminated Composite Coatings: A Solution for Improved Adhesion



9:30-10:00: Susumu Suzuki and Satoshi Takeda; Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, JAPAN; Role of Chemical Bond in Adhesion of Thin Films Deposited by Plasma Processes



10:00-10:30: COFFEE BREAK



10:30-11:00: M. Inagaki, Y.Sato and M.Murahara; Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, JAPAN; Long-Sustaining Hydrophilic Modification of PET Surface for Artificial Ligament



11:00-11:30: M. Kojima, K.Asano and M.Murahara: Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, JAPAN; SiO2 Film Lamination on Nonlinear Optical Crystal with Photochemical Oxidization of Silicone Oil



11:30-12:00: D. Sasaki, K. Asano and M. Murahara; Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, JAPAN; Excimer Lamp-Induced Photochemical Bonding of Fused Silica Glass and Fluorocarbon Film by Using Organic Silicone Oil for Photochemical Polishing of SiC



12:00-12:30: S. Ben Amor; Institut Supérieur des Sciences Appliquées et de Technologie de Sousse,4003 Sousse Ibn, Khaldoun, TUNISIA; Investigation of Interfacial Interactions Between Polymer and Ceramic Coatings



12:30-1:45: LUNCH BREAK



SESSION IV, TUESDAY, DECEMBER 16, 2003



1:45-2:15: P. M. Martin, G. L. Graff, M. E. Gross, P. E. Burrows, W. D. Bennett, M. Hall, E. Mast, C. C. Bonham and M. Zumhoff; Batelle Pacific Northwest Laboratory P.O. Box 999, MS K3-59, Richland, WA 99352; Adhesion Issues with Polymer/Oxide Barrier Coatings on Organic Displays



2:15-2:45: J. Friedrich, R. Mix, G. Kühn and W. Unger; Bundesanstalt für Materialforschung und -prüfung, 12200 Berlin, GERMANY; Contribution of Chemical Interactions Between Different Types of Functional Groups and Metal Atoms to the Adhesion of Metal-Polymer Composites



2:45-3:15: O. Knotek, E. Lugscheider, M. Maes and A. Krämer; Materials Science Institute, Aachen University, 52062 Aachen, GERMANY; Deposition of Aluminum on Three Dimensional Polymer Substrates



3:15-3:30: COFFEE BREAK



3:30-4:00: Y. Tezuka and M.Murahara; Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, JAPAN; Photochemical Lamination of Transparent SiO2 Thin Film on PMMA Surface at Room Temperature



4:00-4:30: M. Ignat ,B.A. Latella, C.Barbé and G. Triani; CNRS, INP Grenoble. BP 75, D.Universitaire, 38402 St M. d'Hères, FRANCE; Mechanical Stability of a TiO2 Coating Deposited on a Polycarbonate Substrate



4:30-5:00: S. Befahy, A. Delcorte, C. Poleunis, M. Troosters and P. Bertrand; Unité de Physico-Chimie et de Physique des Matériaux, Université Catholique de Louvain, Croix du Sud 1, B-1348, Louvain-la-Neuve, BELGIUM; Adherence Improvement for Metallized Silicone Films