FINAL PROGRAM



TENTH INTERNATIONAL SYMPOSIUM ON PARTICLES

ON SURFACES: DETECTION, ADHESION AND REMOVAL

NOVOTEL Hotel, Toronto, Canada; June 19-21, 2006

This will be the tenth event in the series of symposia on particles on surfaces initiated as part of the Fine Particle Society meeting in 1986. Particles are yield detractors in the manufacture of sophisticated and sensitive electronic components and are very undesirable in many other technologies. Contamination of optical surfaces and shorting of microelectronic circuits by conducting particles, among other concerns, underscore the importance of particle detection, adhesion and removal. On the other hand, however, in certain instances particle adhesion to surfaces is necessary. The purpose of this symposium is to address the vast ramifications of particles on solid surfaces by bringing together specialists in many allied fields to discuss their latest findings and to identify areas for further investigation. Various types of substrates and particles including metals, oxides, glass, and polymers are covered. Finally, it is apropos that this meeting is being held back to back with the FIFTH INTERNATIONAL SYMPOSIUM ON CONTACT ANGLE, WETTABILITY AND ADHESION. Both of these symposia share a common and critical interest in the surface free energy of solid materials. The particle removal investigator knows this quantity strongly affects particle adhesion and for the contact angle person it is one of the prime measurement objectives. Thus on Wednesday the 21st we plan to bring both groups together for a joint session with papers of interest to both camps. It is hoped that a cross-fertilization of ideas will lead to insights of mutual benefit to all. The following is the list of papers to be presented at this meeting. Please note that the address given may apply only to the presenting author



SESSION I: DETECTION AND MEASUREMENT METHODS; Monday, June 19, 2006



8:30-8:35: INTRODUCTORY REMARKS

8:35-9:05: R. Snel, J. C. J. van der Donck, J. H. van den Berg, H. Meiling and H. Meijer; TNO Science & Industry, P.O. box 155, 2600 JA Delft, THE NETHERLANDS; Particle Detection on Flat Substrates

9:05-9:35: Kenneth J. Ward, Milo Overbay and John W. Hellgeth, Hewlett-Packard Company, Corvallis, Oregon; Chemical Identification of Submicron Size Organic Particles Using Conventional FTIR Microscopy: New Horizons for an Old Technique.

9:35-10:05: P.West and N. Starostina; "PacificNanotechnology" Inc., 17984 Sky Park Circle, Suite J, Irvine, CA 92614; AFM Capabilities in Characterization of Particles: from Angstroms to Microns



10:05-10:25: COFFEE BREAK



10:25-10:55: Stephen Silverman and Toufic Najia; Bartlett Bay Consulting,10 Stanhope Rd, So. Burlington, VT 05403; The Flip-Side of the Wafer: Backside Particles

10:55-11:25: A. S. Geller and C. C. Walton; Lawrence Livermore National Laboratory, 7000 East Ave., Livermore, CA 94550; Improved Reticle Carrier Design Through Numerical Simulation

11:25-11:55: Peter X. Feng, P.Yang, Gerardo Morell, Ram Katiyar, and Brad Weiner; Physics Department, University of Puerto Rico, San Juan, PR 00931; Control of the Preferred Orientation of Nanoscale Carbon Particle Distributions



11:55-1:30: LUNCH



SESSION II: CLEANING TECHNOLOGY; Monday, June 19, 2006

1:30-2:00: John Durkee; 437 Mack Hollimon, Kerrville, TX 78028; 500 New Cleaning Solvents Discovered!!

2:00-2:30: Adam Judd, Timothy Fredette, Tania Alarcon, Sherry Kirkland, Gary Stickel, Daniel Heenan, Adam Kulczyk, and Robert Kaiser; Entropic Systems, Inc., P.O. Box 397, Winchester, MA 01890-0597; Development of a Two Step Precision Cleaning Process for the Decontamination of Sensitive Equipment Items Contaminated with Chemical Warfare Agents

2:30-3:00: A. Lippert, P. Engesser, M. Köffler, F. Kumnig, R. Obweger, A. Pfeuffer and H. Okorn-Schmidt; SEZ AG, Research Center, Draubodenweg 29, 9500 Villach, AUSTRIA; Keys to Advanced Single Wafer Cleaning



3:00-3:20: COFFEE BREAK



3:20-3:50: Craig M.V. Taylor, J. B. Rubin, A. Busnaina and L.D Sivils; Los Alamos National Laboratory, Mail Stop J-964, Los Alamos, NM 87545; Precision Cleaning of Semi-conductor Surfaces Using C2 Based Fluids

3:50-4:20: Thomas Bahners, Helga Thomas and Eckhard Schollmeyer; Deutsches Textilforschungszentrum Nord-West e. V., Adlerstr. 1, 47798 Krefeld, GERMANY; Electrospun Nanofibers - a Way to Improved Wet Filtration Efficiency of Textile Filter Media



SESSION III: PARTICLE INTERACTIONS AND ADHESION; Tuesday, June 20, 2006

8:30-9:00: Mahdi Farshchi-Tabrizi, Michael Kappl and Hans-Jürgen Butt; MPI for Polymer Research, Ackermannweg 10, 55128 Mainz, GERMANY; Influence of Humidity on Adhesion: an AFM Study

9:00-9:30: Niels P. Boks, Henny C. van der Mei, Willem Norde and Henk J. Busscher; Department of BioMedical Engineering, University Medical Center Groningen and University of Groningen, Antonius Deusinglaan 1, 9713 AV Groningen, THE NETHERLANDS; Microbial Adhesion Forces Studied in a Parallel Plate Flow Chamber

9:30-10:00: F. Barbagini, W. Fyen, J. V. Hoeymissen, P. Mertens and J. Fransaer; IMEC, Kapeldreef 75, 3001 Heverlee, BELGIUM; Time-dependent Interaction Force Between a Silica Particle and a Flat Silica Surface in Dodecane



10:00-10:20: COFFEE BREAK



10:20-10:50: W. Wójcik , B. Jaczuk and R. Ogonowski; Department of Interfacial Phenomena, Faculty of Chemistry, Maria Curie-Skodowska University, 20-031 Lublin, POLAND; Interaction of Silica Particles Through a Liquid

10:50-11:20: Alex Kabansky; Cypress Semiconductor, San Jose, CA 95134; Progress in Wafer Cleaning focusing on Particles, Residue and Defects for Sub-100nm Silicon-Based CMOS Devices

11:20-11:50: Klaus Opwis, Frank Schroeter, Torsten Textor and Eckhard Schollmeyer; German Textile Research Center North - West; Adlerstr. 1; D-47798 Krefeld, GERMANY; Titanium Dioxide Nanoparticles in Photocatalytic Textile Applications



11:50-1:30: LUNCH



SESSION IV: PARTICLE ADHESION AND REMOVAL; Tuesday, June 20, 2006

1:30-2:00: K. J. Belde and S.J. Bull; School of Chemical Engineering and Advanced Materials, University of Newcastle, Newcastle upon Tyne, NE1 7RU, UK; Intentional Polymer Particle Contamination and the Simulation of Adhesion Failure in Transit Scratches in Ultra-Thin Solar Control Coatings on Glass

2:00-2:30: Astrid Roosjen; University of Wageningen, Laboratory of Physical Chemistry and Colloid Science, Dreijenplein 6, Wageningen 6703 HB, THE NETHERLANDS; Adhesion, Prevention of Adhesion and Removal of Bacteria from Surfaces in Aqueous Environment

2:30-3:00: Jin-Goo Park; Hanyang University, Div. of Materials and Chemical Engineering, Ansan 426-791, KOREA; The Effect of Chemicals on Adhesion and Removal of Slurry Particles During Cu CMP

3:00-3:30: Yakov Epshteyn, A. Scott Lawing and Jesse Federowicz; Rohm and Haas Electronic Materials CMP Inc., 3804 E. Watkins St., Phoenix, AZ 85032; Ceria Slurry Particles Removal Optimization

3:30-4:00: Ahmed A. Busnaina and Jin-Goo Park2; NSF Center for Nano and Microcontamination Control, Northeastern University, Boston, MA; Experimental and Numerical Investigation of Nanoparticle Removal



SESSION V: PARTICLE WETTING AND INTERACTIONS: JOINT SESSION WITH CONTACT ANGLE SYMPOSIUM; Wednesday, June 21, 2006



8:00-8:05: INTRODUCTORY REMARKS

8:05-8:35: Jerry Y. Y. Heng and Daryl R. Williams; Department of Chemical Engineering, Imperial College London, South Kensington Campus, London SW7 2AZ, UK; The Influence of Surface Chemistry in the Wetting Behaviour of Crystalline Pharmaceutical Solids

8:35-8:55: Laurent Forny, Khashayar Saleh, Isabelle Pezron, Ljepsa Komunjer and Pierre Guigon; Laboratoire Génie des Procédés Industriels, UMR CNRS 6067 Université de Technologie de Compiègne, 60205 Compiègne Cedex, FRANCE; Influence of Wetting Parameters and Mixing Conditions on Characteristics of Water-rich Powders Obtained by Encapsulation

8:55-9:15: Glen McHale, Michael I. Newton, Neil J. Shirtcliffe, F. Brian Pyatt and Stefan H. Doerr; School of Biomedical & Natural Sciences, Nottingham Trent University, Clifton Lane, Nottingham NG11 8NS, UK; Self-organisation of Soil and Granular Surfaces

9:15-9:45: B.P. Binks, J. H. Clint, P.D.I. Fletcher, T.J.G. Lees and P. Taylor; Surfactant & Colloid Group, Department of Chemistry, The University of Hull, Hull HU6 7RX, UK; Effect of Surface Wettability on the Growth of Gold Nanoparticle Films

9:45-10:15: D. Clausse , L. Sacca, F. Gomez and I. Pezron; Université de Technologie de Compiègne , Département de Génie Chimique, CNRS UMR 6067 GPI, BP 20529, 60205 Compiègne cedex, FRANCE; Emulsions Stabilized by Nanoparticles



10:15-10:35: COFFEE BREAK



10:35-11:05: Chuan Guo Ma Min Zhi Rong and Ming Qiu Zhang; Materials Science Institute, Zhongshan University, Guangzhou 510275, P. R. CHINA; Use of Wetting Coefficient plus Surface and Adhesive Work to Predict Dispersion State of Nano-CaCO3 Fillers

11:05-11:35: Anselm Kuhn, and John Durkee; 437 Mack Hollimon, Kerrville, TX 78028; Wettability Measurements for Surface Cleanliness Testing - an Old Technique Revisited & Updated

11:35-11:55: Carel Jan van Oss; Department of Microbiology and Immunology; Department of Chemical and Biological Engineering, and Department of Geology; University at Buffalo, State University of New York, South Campus, Buffalo, NY 14214-3000; Properties of Water in Colloidal And Biological Systems

11:55-12:15: Po-zen Wong; Department of Physics, University of Massachusetts, Amherst, MA 01002; Multilayer Adsorption on Fractal Surfaces



12:15-1:35: LUNCH



SESSION VI: COLLOIDS, POWDERS AND DROPLETS: FRACTAL AND WETTING ASPECTS; Wednesday, June 21, 2006

1:35-2:05: M. Ojha, S. Panchangam. P.C. Wayner, Jr. and J. L. Plawsky; Dept of Chemical and Biological Engineering, Rensselaer Polytechnic Institute 110 Eighth St., Troy, NY 12180; Effects of Surface Structure on Contact Line Behavior

2:05-2:35: Anton A. Darhuber, Nikolai V. Priezjev and Sandra M. Troian, Microfluidic Research & Engineering Laboratory, Princeton University, Princeton, NJ 08544-5263; Slip Behavior at Liquid/Solid Interfaces: Hydrodynamic Predictions versus Molecular-Dynamics Simulations

2:35-2:55: S. F. Chini, H. Sadeghy, A. Milne, W. Moussa and A. Amirfazli; Department of Mechanical Engineering, University of Alberta, 4-9 Mechanical Engineering Building, Edmonton, AB, T6G 2G8, CANADA; Study of Pattern Collapse During Photolithography of Submicron Features Due to Capillary and Surface Tension Forces

2:55-3:25: Aiping Fang, Thierry Ondarçuhu, Erik Dujardin, André Meister and Raphaël Pugin; Centre d'Elaboration des Matériaux et d'Etudes Structurales, CEMES-CNRS, 29 rue Jeanne Marvig, 31055 Toulouse cedex 4, FRANCE; Nanoscale Dispensing of Droplets

3:25-3:45: Thierry Ondarçuhu and Agnès Piednoir; Nanoscience group, CEMES-CNRS, 29 rue Jeanne Marvig, 31055 Toulouse, FRANCE; Interaction of a Contact Line With Nanometric Steps



3:45-4:05: COFFEE BREAK



4:05-4:25: Mariëlle Wouters; TNO Industrial Technology, Polymer Technology, De Rondom 1, 5612 AP Eindhoven, THE NETHERLANDS; Aspects of Wettability and the Improvement of Adhesion of UV Curable Powdercoatings on Polypropylene Substrates

4:25-4:45: Dandina N. Rao and Subhash C. Ayirala; The Craft & Hawkins Department of Petroleum Engineering, Louisiana State University, Baton Rouge, LA 70803-6417; Mechanistic Modeling of Dynamic Vapor-Liquid Interfacial Tension in Complex Petroleum Fluids

4:45-5:15: O. Karoussi, A. A. Hamouda; University of Stavanger, P. O. Box 8002 Ullandhaug, 4068 NORWAY; The Effect of Binary Fatty Acids Systems on Partitioning, IFT and Wettability of Calcite Surfaces

5:15-5-45: Frank Schröter, Thomas Sottmann, Dierk Knittel and Eckhard Schollmeyer; Deutsches Textilforschungszentrum Nord-West e. V., Adlerstr. 1, 47798 Krefeld, GERMANY; Phase Behavior of Non-ionic Microemulsions of Water/Silicone Oil/Surfactant


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