CALL FOR PAPERS

INTERNATIONAL SYMPOSIUM ON

SURFACE CONTAMINATION

AND CLEANING

To be held May 24-25, 2001 at the

Robert Treat Hotel; Newark, NJ

This symposium continues the tradition set by its progenitor "Surface Contamination: Genesis, Detection and Control" which was held in Washington DC in 1978. As with its predecessor, this symposium will be concerned with the technological areas where surface cleaning is of cardinal importance such as adhesion, composites, adsorption, friction, lubrication, soldering, device fabrication and precision machine parts to name just a few where surface contamination has always been a fiendish adversary. This symposium is organized to bring together scientists, technologists and engineers interested in all aspects of surface contamination, to review and assess the current state of knowledge, to provide a forum for exchange and cross-fertilization of ideas and to define problem areas which need intensified efforts. Both particulate and film type contaminants will be covered. Finally, cleaning methods for all kinds of surfaces (glass, metals, plastics,... etc.) are within the purview of this symposium.

The invited speakers have been selected so as to represent widely differing disciplines and interests, and they hail from academic, governmental and industrial research laboratories. This meeting is planned to be a truly international event both in geographic coverage as well as in spirit. The technical program will contain both invited overviews and contributed original research papers. It is planned to chronicle the transactions in a hard-bound volume of archival quality (to match or exceed the standards of the journal literature) which will serve as a reference work for future generations of investigators.

Among the topics to be covered are:

Sources, forms and mechanisms of surface contamination
Detection, analysis, characterization and control of contaminants

Surface cleaning techniques

Atomically clean surfaces
Surface inspection methods including ESCA, SIMS, ISS, Atomic Force Microscopy, Scanning Tunneling Microscopy and related techniques

APPLICATIONS:

Cleaning plastic surfaces
Cleaning machine parts, optics
Semiconductor manufacturing
Biomedical applications, cleaning of surgical instruments
Aerospace applications, satellites and space vehicles

This symposium is being organized by MST Conferences, LLC under the direction of Dr. K. L. Mittal, Editor, Journal of Adhesion Science and Technology. A proceedings volume is planned for this symposium and further details will be provided in due course. Please notify the conference chairman of your intentions to present a paper as early as possible. An abstract of about 200 words should be sent by January 15, 2001 to the conference chairman by any of the following methods:

E-mail: rhl@mstconf.com

FAX: 212-656-1016

Regular mail:

Dr. Robert H. Lacombe

Conference Chairman

3 Hammer Drive

Hopewell Junction, NY 12533

Contact by phone: 845-226-1393

CLICK HERE TO SUBMIT AN ABSTRACT OR GET ON CONFERENCE MAILING LIST: ONLINE RESPONSE FORM

MST Conferences Webmaster
Your comments and inquiries are most welcome
Address all correspondence to:
rhlacombe@compuserve.com