FINAL PROGRAM
SECOND INTERNATIONAL SYMPOSIUM ON PLASMA POLYMERIZATION/DEPOSITION: FUNDAMENTAL AND APPLIED ASPECTS
MAY 27-28, 1999 ITT SHERATON NEWARK AIRPORT NEWARK, NJ
Tel. 914-226-1393
FAX: 914-226-5173
E-mail: klm@mstconf.com
R. H. Lacombe, Chairman
3 Hammer Drive
Hopewell Junction, NY 12533, USA
Tel. 914-227-7026
FAX: 212-656-1016
E-mail: rhl@mstconf.com
Click here to register online
SESSION I. Thursday, May 27, 1999
8:30-8:35: Opening Remarks.
8:35-9:05: Organic Layers from Pulsed PECVD
of Unsaturated Monomers - an Overview; J.
Behnisch and A. Holländer; Fraunhofer-Institut
für Angewandte Polymerforschung, Kantstr. 55,
D-14513 Teltow, GERMANY
9:05-9:35: Chemically Well-Defined Polymer
Layers by Grafting or Pulse Plasma
Polymerization; G. Kühn, I. Retzko, A. Ghode, St.
Weidner, W. E. S. Unger, A. Lippitz and J. F.
Friedrich; Federal Institute for Materials Research
and Testing (BAM) D-12200 Berlin, GERMANY
9:35-10:05: A High Rate Process for Deposition
of Plasma Polymerized Films from High Molecular
Weight/Low Vapor Pressure Liquid or Solid
Monomer Precursors; John Affinito, Materials
Science Department, Mail Stop K3-59, Pacific
Northwest Laboratory, Richland, WA 99352
10:05-10:35: COFFEE BREAK
10:35-11:05: Plasma Polymerized Coatings for
Corrosion Control: Potentialities and Limitations;
Michael F. Nichols, Atomic Paint Shop, 3334
Brown Station Road, Columbia, MO 65202
11:05-11:35: Novel Plasma Reactors for Surface
Functionalization Processes: Dense Medium
Plasma Reactor, Rotating Plasma-Reactor and
Continuous-Flow System Plasma Reactor; F.
Denes and S. Manolache; Center for
Plasma-Aided Manufacturing, University of
Wisconsin-Madison, Madison WI 53706
11:35-12:05: A Novel Atmospheric Plasma
System for Surface Treatment; A Yializis, S. A.
Pirzada and W. Decker; Sigma Technologies
International Inc., 10960 N. Stallard Place,
Tucson, AZ 85737
12:05-1:30 LUNCH
SESSION II. Thursday, May 27, 1999
1:30-2:00: Combining Gas-Phase and Surface
Interaction Measurements to Explore Mechanisms
for Plasma Polymerization; Carmen I. Butoi,
Nathan E. Capps, Neil M. Mackie, Michelle L.
Steen, and Ellen R. Fisher, Department of
Chemistry, Colorado State University, Fort
Collins, CO 80524-1872
2:00-2:30: Deposition of Plasma-Polymerized
Organic Monomers on Particulate Materials; W. J.
van Ooij, Ning Zhang and Aditya Chityala;
Department of Materials Science and Engineering,
University of Cincinnati, Cincinnati, OH 45221-0012
2:30-3:00: Plasma Enhanced Intrinsic Hydrophilic
Polymerization on Metal Substrates; Seok-Keun
Koh1, Ki-Hwan Kim1, Elena Klakina2 and Samchul
Ha3; 1) Thin Film Technology Research Center,
Korea Institute of Science and Technology,
P.O.Box 131, Cheongryang, Seoul 130-650,
KOREA. 2) Plasma Tech Co., R&D Center, 506-10
Youlmi-Ri, Kyungki-Do, KOREA. 3) LG Electronics
Inc., 76 Changwon Kyung Nam 641-711, KOREA
3:00-3:30 COFFEE BREAK
3:30-4:00: Improved Rubber Adhesion of Textile
Tire Cords by Deposition of Plasma-Polymerized
Films; W. J. Van Ooij and Shijian Luo; Department
of Materials Science and Engineering, University of
Cincinnati, Cincinnati, OH 45221-0012
4:00-4:30: Plasma Polymerisation and
Copolymerisation to Enhance Cell Attachment,
Spreading and Proliferation; R. D. Short, Centre
for Biomaterials and Tissue Engineering,
Laboratory of Surface and Interface Analysis,
Department of Engineering Materials, University of
Sheffield, Mappin Street, Sheffield, S1 3JD, UK
4:30-5:00: SiOx Deposition from Plasma
Polymerization of Tetramethoxysilane for Oxygen
Gas Barrier Material; N. Inagaki and S. Tasaka;
Lab. of Polymer Chemistry, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, JAPAN
SESSION III. Friday, May 28, 1999
8:30-9:00: Ultrahydrophobic Polymeric Surfaces Using Plasma Chemistry; Meng Che-Hsieh, Jeffrey P. Youngblood, Wei Chen and Thomas McCarthy; Polymer Science and Engineering Department, University of Massachusetts, Amherst, MA 01003.
9:00-9:30: Optical Spectroscopic Characterization of Plasma Deposited Polymer Films; Kwanghee Lee1, Yunhee Chang1, Hyunuk Lee2, Joong-Hwan Yang2 and Samchul Ha2; 1) Department of Physics, Pusan National University, Pusan 609-735, KOREA. 2) LG Electronics Inc., Changwon 641-711, KOREA
9:30-10:00: New Deposition Source for
Depositing High Rate Metal and Polymeric Doped
Ceramic Thin Films; John Felts; Nano Scale
Surface Systems, Inc., 2021 Alaska Packer
Place #3, Alameda, CA 94501
10:00-10:30 COFFEE BREAK
10:30-11:00: Oxygen Barrier Properties of
Plasma-deposited SiOx Coatings on Various
Substrates; Kenth Johansson; Institute for
Surface Chemistry (YKI), P.O. Box 5607,SE-11486 Stockholm, SWEDEN
11:00-11:30: Mechanism of Silica Film
Formation from Tetraethoxysilane in Remote
Oxygen Plasma Chemical Vapor Deposition;
Aleksander M. Wróbel; Centre of Molecular and
Macromolecular Studies, Polish Academy of
Sciences, Sienkiewicza 112, 90-363 Lodz,
POLAND
11:30-12:00: Vacuum Arc Deposition of Wear
Resistant Coatings on Polymer Substrates; V.N.
Zhitomirsky1, I. Grimberg2, M.C. Joseph3, R.L.
Boxman1, S. Goldsmith1, A. Matthews3, and B.Z.
Weiss2; 1) Electrical Discharge and Plasma
Laboratory, Tel-Aviv University, POB 39040,
Tel-Aviv 69978, ISRAEL. 2) Department of
Materials Engineering, Technion - Israel Institute
of Technology, Haifa 3200, ISRAEL. 3) Research
Centre in Surface Engineering, University of Hull,
Cottingham Road, Hull HU6 7RX, UK
12:00-1:30 LUNCH
SESSION IV. Friday, May 28, 1999
1:30-1:55: RF Plasma Deposition of
Carbon/Germanium Films from Alkyl Germanium
Derivatives; Maciej Gazicki-Lipman; Institute for
Materials Engineering, Technical University of
Lodz, ul Syefanowskiego 1/15, 90-924 Lodz,
POLAND
1:55-2:20: Growth of Cubic Boron Nitride Thin
Film by Low Pressure Inductively Coupled Radio
Frequency Plasma; K.K. Chattopadhyay,
Department of Physics, Jadavpur University,
Calcutta - 700 032, INDIA
2:20-2:45: Characterization of Diamond-Like
Nanocomposite Thin Film Coatings for Biomedical
Applications; Craig A. Outten, Chris Halter, Phil
Swab, and Donald J. Bray, Advanced Coatings
Division, Advanced Refractory Technologies, Inc.,
699 Hertel Avenue, Buffalo, NY 14214.
2:45-3:10: The Interaction of Epitropic Liquid
Crystals with DLC, Deposited by Ion Assisted
Deposition; V. A. Levchenko, M. B. Guseva, V. G.
Babaev and V. N. Matveenko; Department of
Colloid Chemistry, Moscow State University,
Leninskii Gory, Moscow 119899, RUSSIA
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