FINAL PROGRAM

SECOND INTERNATIONAL SYMPOSIUM ON PLASMA POLYMERIZATION/DEPOSITION: FUNDAMENTAL AND APPLIED ASPECTS

MAY 27-28, 1999 ITT SHERATON NEWARK AIRPORT NEWARK, NJ

K. L. Mittal, Director
92 Saddle Ridge Drive
Hopewell Junction, NY 12533, USA

Tel. 914-226-1393
FAX: 914-226-5173
E-mail: klm@mstconf.com

R. H. Lacombe, Chairman
3 Hammer Drive
Hopewell Junction, NY 12533, USA

Tel. 914-227-7026
FAX: 212-656-1016
E-mail: rhl@mstconf.com

Click here to register online

SESSION I. Thursday, May 27, 1999

8:30-8:35: Opening Remarks.

8:35-9:05: Organic Layers from Pulsed PECVD of Unsaturated Monomers - an Overview; J. Behnisch and A. Holländer; Fraunhofer-Institut für Angewandte Polymerforschung, Kantstr. 55, D-14513 Teltow, GERMANY

9:05-9:35: Chemically Well-Defined Polymer Layers by Grafting or Pulse Plasma Polymerization; G. Kühn, I. Retzko, A. Ghode, St. Weidner, W. E. S. Unger, A. Lippitz and J. F. Friedrich; Federal Institute for Materials Research and Testing (BAM) D-12200 Berlin, GERMANY

9:35-10:05: A High Rate Process for Deposition of Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors; John Affinito, Materials Science Department, Mail Stop K3-59, Pacific Northwest Laboratory, Richland, WA 99352

10:05-10:35: COFFEE BREAK

10:35-11:05: Plasma Polymerized Coatings for Corrosion Control: Potentialities and Limitations; Michael F. Nichols, Atomic Paint Shop, 3334 Brown Station Road, Columbia, MO 65202

11:05-11:35: Novel Plasma Reactors for Surface Functionalization Processes: Dense Medium Plasma Reactor, Rotating Plasma-Reactor and Continuous-Flow System Plasma Reactor; F. Denes and S. Manolache; Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison, Madison WI 53706

11:35-12:05: A Novel Atmospheric Plasma System for Surface Treatment; A Yializis, S. A. Pirzada and W. Decker; Sigma Technologies International Inc., 10960 N. Stallard Place, Tucson, AZ 85737

12:05-1:30 LUNCH

SESSION II. Thursday, May 27, 1999

1:30-2:00: Combining Gas-Phase and Surface Interaction Measurements to Explore Mechanisms for Plasma Polymerization; Carmen I. Butoi, Nathan E. Capps, Neil M. Mackie, Michelle L. Steen, and Ellen R. Fisher, Department of Chemistry, Colorado State University, Fort Collins, CO 80524-1872

2:00-2:30: Deposition of Plasma-Polymerized Organic Monomers on Particulate Materials; W. J. van Ooij, Ning Zhang and Aditya Chityala; Department of Materials Science and Engineering, University of Cincinnati, Cincinnati, OH 45221-0012

2:30-3:00: Plasma Enhanced Intrinsic Hydrophilic Polymerization on Metal Substrates; Seok-Keun Koh¹, Ki-Hwan Kim¹, Elena Klakina² and Samchul Ha³; 1) Thin Film Technology Research Center, Korea Institute of Science and Technology, P.O.Box 131, Cheongryang, Seoul 130-650, KOREA. 2) Plasma Tech Co., R&D Center, 506-10 Youlmi-Ri, Kyungki-Do, KOREA. 3) LG Electronics Inc., 76 Changwon Kyung Nam 641-711, KOREA

3:00-3:30 COFFEE BREAK

3:30-4:00: Improved Rubber Adhesion of Textile Tire Cords by Deposition of Plasma-Polymerized Films; W. J. Van Ooij and Shijian Luo; Department of Materials Science and Engineering, University of Cincinnati, Cincinnati, OH 45221-0012

4:00-4:30: Plasma Polymerisation and Copolymerisation to Enhance Cell Attachment, Spreading and Proliferation; R. D. Short, Centre for Biomaterials and Tissue Engineering, Laboratory of Surface and Interface Analysis, Department of Engineering Materials, University of Sheffield, Mappin Street, Sheffield, S1 3JD, UK

4:30-5:00: SiOx Deposition from Plasma Polymerization of Tetramethoxysilane for Oxygen Gas Barrier Material; N. Inagaki and S. Tasaka; Lab. of Polymer Chemistry, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, JAPAN

SESSION III. Friday, May 28, 1999

8:30-9:00: Ultrahydrophobic Polymeric Surfaces Using Plasma Chemistry; Meng Che-Hsieh, Jeffrey P. Youngblood, Wei Chen and Thomas McCarthy; Polymer Science and Engineering Department, University of Massachusetts, Amherst, MA 01003.

9:00-9:30: Optical Spectroscopic Characterization of Plasma Deposited Polymer Films; Kwanghee Lee¹, Yunhee Chang¹, Hyunuk Lee², Joong-Hwan Yang² and Samchul Ha²; 1) Department of Physics, Pusan National University, Pusan 609-735, KOREA. 2) LG Electronics Inc., Changwon 641-711, KOREA

9:30-10:00: New Deposition Source for Depositing High Rate Metal and Polymeric Doped Ceramic Thin Films; John Felts; Nano Scale Surface Systems, Inc., 2021 Alaska Packer Place #3, Alameda, CA 94501

10:00-10:30 COFFEE BREAK

10:30-11:00: Oxygen Barrier Properties of Plasma-deposited SiOx Coatings on Various Substrates; Kenth Johansson; Institute for Surface Chemistry (YKI), P.O. Box 5607,SE-11486 Stockholm, SWEDEN

11:00-11:30: Mechanism of Silica Film Formation from Tetraethoxysilane in Remote Oxygen Plasma Chemical Vapor Deposition; Aleksander M. Wróbel; Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 Lodz, POLAND

11:30-12:00: Vacuum Arc Deposition of Wear Resistant Coatings on Polymer Substrates; V.N. Zhitomirsky¹, I. Grimberg², M.C. Joseph³, R.L. Boxman¹, S. Goldsmith¹, A. Matthews³, and B.Z. Weiss²; 1) Electrical Discharge and Plasma Laboratory, Tel-Aviv University, POB 39040, Tel-Aviv 69978, ISRAEL. 2) Department of Materials Engineering, Technion - Israel Institute of Technology, Haifa 3200, ISRAEL. 3) Research Centre in Surface Engineering, University of Hull, Cottingham Road, Hull HU6 7RX, UK

12:00-1:30 LUNCH

SESSION IV. Friday, May 28, 1999

1:30-1:55: RF Plasma Deposition of Carbon/Germanium Films from Alkyl Germanium Derivatives; Maciej Gazicki-Lipman; Institute for Materials Engineering, Technical University of Lodz, ul Syefanowskiego 1/15, 90-924 Lodz, POLAND

1:55-2:20: Growth of Cubic Boron Nitride Thin Film by Low Pressure Inductively Coupled Radio Frequency Plasma; K.K. Chattopadhyay, Department of Physics, Jadavpur University, Calcutta - 700 032, INDIA

2:20-2:45: Characterization of Diamond-Like Nanocomposite Thin Film Coatings for Biomedical Applications; Craig A. Outten, Chris Halter, Phil Swab, and Donald J. Bray, Advanced Coatings Division, Advanced Refractory Technologies, Inc., 699 Hertel Avenue, Buffalo, NY 14214.

2:45-3:10: The Interaction of Epitropic Liquid Crystals with DLC, Deposited by Ion Assisted Deposition; V. A. Levchenko, M. B. Guseva, V. G. Babaev and V. N. Matveenko; Department of Colloid Chemistry, Moscow State University, Leninskii Gory, Moscow 119899, RUSSIA

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